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High purity 4N Nickel Ni Sputtering Target for Metal Thin Film Coating

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Nickel Sputtering Target Nickel Sputtering Target

High purity 4N Nickel Ni Sputtering Target for Metal Thin Film Coating

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product details

High purity 4N Nickel Ni Sputtering Target for Metal Thin Film Coating

Introduction


 Thin film coating materials 99.99% Nickel sputtering target

Product Name

Nickel (Ni)sputtering target

Available Purity(%)

99.99(4N),99.995(4N5)

Shape

Planar, round

Size

as your request

Melting point(℃)
1453
Density(g/cm³)

8.9

Boiling point(℃)
2732
Technology
Vacuum Melting, Patented thermo-mechanical process and machine work
Application
Glass Coating & Decoration




Nickel target


Nickel target






tags : Ni Sputtering Target Nickel Ni Sputtering Target High purity 4N Nickel Ni Sputtering Target
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