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Credit Card L/C D/A D/P T/T Western UnionGallium Nitride on Silicon Wafer Single Crystal Substrate
The GaN on Silicon wafer is to deposite a GaN thin film layer on semiconductor silicon wafer, by use this method to reduce costs and to replace Gallium Nitride single crystal substrate.
We can customize the GaN on Silicon wafer upon customer's requirements.
Standard Specification
ITEM
Gallium Nitride on Silicon wafer, GaN on Silicon wafer
GaN thin film
0.5μm ± 0.1 μm
GaN orientation
C-plane (0001)
Ga-face
<1nm, As-grown, EPI-ready
N-face
P-type/B-doped
Polarity
Ga-face
Conductivity type
Undoped/N-type
Macro defect density
Silicon wafer substrate
Orientation
<100>
Conductivity type
N-type/P-doped or P-type/B-doped
Dimension:
10 x 10 x 0.5mm, Single side polished
Resistivity
1-5 ohm-cm, 0-10 ohm-cm, <0.005 ohm-cm or others
<5/cm^2
Dia. 2” x 0.5mm, Single side polished
Dia. 4" x 0.525mm, Single side polished
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com
Wechat:18832681205 Whatsapp :+86 18832681205 Email: Daisy@foam-material.com